Transformer coupled plasma source design for thin dielectric film deposition

Plasma generator systems are provided. Plasma generators, or plasma sources, may flow process gas into a plasma to generate ions, neutral particles, and/or radicals that may be used to physically and/or chemically alter a substrate. In some implementations, the plasma source may be designed to impro...

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Bibliographische Detailangaben
Hauptverfasser: QIU, HUA-TAN, MCKERROW, ANDREW JOHN, KHOJASTEH, MALAK, GUO, TONG-TONG, CHEN, LEE, GONG, BO, BATZER, RACHEL E, JUAREZ, FRANCISCO J, GUI, ZHE
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Plasma generator systems are provided. Plasma generators, or plasma sources, may flow process gas into a plasma to generate ions, neutral particles, and/or radicals that may be used to physically and/or chemically alter a substrate. In some implementations, the plasma source may be designed to improve associated fabrication operations.