Substrate supporter, plasma processing apparatus, and plasma processing method
There is provided a substrate supporter supporting a substrate comprising a base, a first ceramic layer on the base, and a second ceramic layer on the first ceramic layer. The first ceramic layer has a first base portion made of a first ceramic, and a plurality of heater electrodes included in the f...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | There is provided a substrate supporter supporting a substrate comprising a base, a first ceramic layer on the base, and a second ceramic layer on the first ceramic layer. The first ceramic layer has a first base portion made of a first ceramic, and a plurality of heater electrodes included in the first base portion and for adjusting a temperature of the substrate. The second ceramic layer has a second base portion made of a second ceramic different from the first ceramic, and an adsorption electrode included in the second base portion and for holding the substrate. |
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