Substrate supporter, plasma processing apparatus, and plasma processing method

There is provided a substrate supporter supporting a substrate comprising a base, a first ceramic layer on the base, and a second ceramic layer on the first ceramic layer. The first ceramic layer has a first base portion made of a first ceramic, and a plurality of heater electrodes included in the f...

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Bibliographische Detailangaben
Hauptverfasser: KAWABATA, ATSUSHI, KOIWA, SHINGO, KUDO, YASUHISA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:There is provided a substrate supporter supporting a substrate comprising a base, a first ceramic layer on the base, and a second ceramic layer on the first ceramic layer. The first ceramic layer has a first base portion made of a first ceramic, and a plurality of heater electrodes included in the first base portion and for adjusting a temperature of the substrate. The second ceramic layer has a second base portion made of a second ceramic different from the first ceramic, and an adsorption electrode included in the second base portion and for holding the substrate.