Process flow of manufacturing a semiconductor device and system for manufacturing a semiconductor device

A process flow of manufacturing a semiconductor device includes the following steps is provided. Establishing a first process rule includes: performing a first process on a first film structure under the first process conditions. Establishing a second process rule includes: performing a second proce...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHIH, PEI-SHAN, LAI, JUNNG, CHANG, YI-SHIANG, LIN, CHIAI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!