Photosensitive composition, dry film, cured product, and electronic component
The present invention addresses the problem of providing a photosensitive composition having low dielectric properties and excellent development contrast. This problem is solved by a photosensitive composition containing a polyphenylene ether A, a polyphenylene ether B, a radically polymerizable com...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention addresses the problem of providing a photosensitive composition having low dielectric properties and excellent development contrast. This problem is solved by a photosensitive composition containing a polyphenylene ether A, a polyphenylene ether B, a radically polymerizable compound, and a photoradical generator, the polyphenylene ethers A, B each being obtained from raw material phenols including a phenol satisfying a condition 1 and a phenol satisfying a condition 2, the polyphenylene ether A having a weight-average molecular weight of more than 40,000 and less than or equal to 200,000 and containing less than 20 mol% of the phenol satisfying the condition 2 relative to all of the raw material phenols, and the polyphenylene ether B containing 20 mol% or more of the phenol satisfying the condition 2 relative to all of the raw material phenols. (Condition 1) Having hydrogen atoms at the ortho and para positions (Condition 2) Having a hydrogen atom at the para position and having a functi |
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