Organometallic adduct compound and method of manufacturing integrated circuit device by using the same

An organometallic adduct compound and a method of manufacturing an integrated circuit device, the organometallic adduct compound being represented by General Formula (I): In General Formula (I), each substituent is the same as defined in the specification.

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Bibliographische Detailangaben
Hauptverfasser: SAITO, KAZUYA, KIM, YOUN-SOO, FUSE, WAKANA, KOIDE, TAKANORI, CHO, YOUN-JOUNG, RYU, SEUNG-MIN, KIM, JAE-WOON, HARANO, KAZUKI, KIMURA, MASAYUKI, AOKI, YUTARO, YOSHII, TAKAHIRO, MANABE, YOSHIKI, PARK, GYU-HEE, UCHIUZOU, HIROYUKI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:An organometallic adduct compound and a method of manufacturing an integrated circuit device, the organometallic adduct compound being represented by General Formula (I): In General Formula (I), each substituent is the same as defined in the specification.