Method of obtaining array of plurality of shot regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus

A method including calculating, using an objective function, which includes a regression model used to estimate an array of a plurality of regions on a substrate and a regularization term used to limit a value of a coefficient of the regression model, a value of each of a plurality of coefficients i...

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Hauptverfasser: SHIGENOBU, ATSUSHI, KIZU, FUMA
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A method including calculating, using an objective function, which includes a regression model used to estimate an array of a plurality of regions on a substrate and a regularization term used to limit a value of a coefficient of the regression model, a value of each of a plurality of coefficients included in the regression model, with which the objective function becomes not more than a reference value, extracting, based on the calculated values, the coefficient having the value not less than a threshold value from the plurality of coefficients, and obtaining, using a regression model including only the extracted coefficient, an array of a plurality of regions on a substrate.