Semiconductor process equipment and a wafer support structure thereof

A semiconductor process equipment and a wafer supporting structure thereof. The wafer support structure comprises a lifting component, a support component, an expansion component and an adjustment component, the lifting component comprises a lifting shaft, and the top surface of the lifting shaft is...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: ZHANG, JUN, HUANG, SHOU-LIN, WEI, JING-FENG, SHE, QING
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A semiconductor process equipment and a wafer supporting structure thereof. The wafer support structure comprises a lifting component, a support component, an expansion component and an adjustment component, the lifting component comprises a lifting shaft, and the top surface of the lifting shaft is provided with a mounting section; The first end of the support component is provided with a mounting hole sleeved on the mounting section; The inner peripheral wall of the installation hole and the outer peripheral wall of the installation section are arranged at intervals to form an adjustment space; The expansion component is sleeved around the installation section and is located in the adjustment space; The adjusting component is connected with the support component, and a part of the adjusting component is located in the adjusting space, and the expansion component is squeezed to deform it to lock the installation section and the support component; The adjusting component is arranged to adjust the extruding de