Apparatuses for thermal management of a pedestal and chamber

Apparatuses for thermal management of a pedestal and chamber

Apparatuses not only capable of reducing unwanted radiative heat loss from a pedestal of a substrate processing system, but also capable of reducing radiative heat transfer to other components within a chamber of the substrate processing system.

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Bibliographische Detailangaben
Hauptverfasser: STRENG, BRADLEY TAYLOR, DURBIN, AARON, CHANDRASEKHARAN, RAMESH, MILLER, AARON BLAKE
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Apparatuses not only capable of reducing unwanted radiative heat loss from a pedestal of a substrate processing system, but also capable of reducing radiative heat transfer to other components within a chamber of the substrate processing system.