Substrate processing apparatus, data processing method, and data processing program

The present invention reduces a workload on a learning task. A substrate processing apparatus includes: a reservoir feature amount generation unit that inputs first sensor data of acquired time series and outputs a reservoir feature amount; a learning unit that in a learning period, learns weighting parameters so that prediction result data acquired by calculating the reservoir feature amount under the weighting parameters correlates with second sensor data of the acquired time series; a prediction unit that in a prediction period, receives input of the first sensor data of the time series to calculate the reservoir feature amount output by the reservoir feature amount generation unit under the learned weighting parameters to thereby output the prediction result data; and a determination unit that in the prediction period, compares the prediction result data and the second sensor data of the acquired time series to thereby determine a state of a substrate manufacturing process.