Exposure apparatus and method for manufacturing article capable of accurately adjusting focus with a small size and simple structure while maintaining an improved throughput

Provided is an exposure apparatus capable of accurately adjusting focus with a small size and simple structure while maintaining an improved throughput. The exposure apparatus according to the present invention is an exposure apparatus that exposes a plurality of shots so as to transfer a first pattern formed on an original onto a plurality of shots on a substrate surface of a substrate, and comprises: a measuring unit having a plurality of channels, each measuring surface heights at predetermined positions of a plurality of shots; and a control unit that adjusts the position of the substrate surface based on the surface height offset value calculated for each of at least one group into which the shots are classified according to the configuration information of the plurality of shots on the substrate surface and the configuration information of the plurality of channels of the measuring unit.