Hardmask composition, hardmask layer, and method of forming patterns
Provided are a hardmask composition including a compound represented by Chemical Formula 1, and a solvent, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns from the hardmask composition. [Chemical Formula 1] wherein, definitions of Chemical For...
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| creator | JOO, BEOM-JUN PARK, IN-KEOL |
| description | Provided are a hardmask composition including a compound represented by Chemical Formula 1, and a solvent, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns from the hardmask composition. [Chemical Formula 1] wherein, definitions of Chemical Formula 1 are as described in the specification. |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Hardmask composition, hardmask layer, and method of forming patterns |
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