Hardmask composition, hardmask layer, and method of forming patterns

Hardmask composition, hardmask layer, and method of forming patterns

Provided are a hardmask composition including a compound represented by Chemical Formula 1, and a solvent, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns from the hardmask composition. [Chemical Formula 1] wherein, definitions of Chemical For...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JOO, BEOM-JUN, PARK, IN-KEOL
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:Provided are a hardmask composition including a compound represented by Chemical Formula 1, and a solvent, a hardmask layer including a cured product of the hardmask composition, and a method of forming patterns from the hardmask composition. [Chemical Formula 1] wherein, definitions of Chemical Formula 1 are as described in the specification.