Antifogging layer and use of same

The present invention provides an antifogging layer which is able to be produced with use of an aqueous solvent, and which is suppressed in change of gloss value in cases where the antifogging layer is exposed to high temperatures. This antifogging layer contains organic fine particles (A); and the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MITSUMOTO, MASATAKA, OGURO, SEIJI, MORII, SHIGEKI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention provides an antifogging layer which is able to be produced with use of an aqueous solvent, and which is suppressed in change of gloss value in cases where the antifogging layer is exposed to high temperatures. This antifogging layer contains organic fine particles (A); and the change ratio between the gloss value (at 60 DEG) of this antifogging layer before being left at rest in a heating environment at 80 DEG C and the gloss value (at 60 DEG) of this antifogging layer after being left at rest in the heating environment for 240 hours and subsequently left at rest in an environment at 23 DEG C and 50% RH for one hour is -5% to +5%.