Semiconductor substrate processing apparatus with a temperature sensor to measure the temperature of a bearing

A semiconductor substrate processing apparatus is provided with a reaction chamber (1); a heater (2) to heat the reaction chamber (1); and a substrate support assembly. The substrate support assembly comprising: a substrate support (3) defining an outer support surface (5) for supporting a substrate...

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Bibliographische Detailangaben
Hauptverfasser: DEN HARTOG-BESSELINK, EDWIN, DAMSMA, WIEBREN HARM, TER VRUGT, ERIK
Format: Patent
Sprache:chi ; eng
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