Semiconductor substrate processing apparatus with a temperature sensor to measure the temperature of a bearing
A semiconductor substrate processing apparatus is provided with a reaction chamber (1); a heater (2) to heat the reaction chamber (1); and a substrate support assembly. The substrate support assembly comprising: a substrate support (3) defining an outer support surface (5) for supporting a substrate...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A semiconductor substrate processing apparatus is provided with a reaction chamber (1); a heater (2) to heat the reaction chamber (1); and a substrate support assembly. The substrate support assembly comprising: a substrate support (3) defining an outer support surface (5) for supporting a substrate or substrate carrier (7) in the reaction chamber (1); and a base assembly including a door (9) for sealing the reaction chamber (1) of the apparatus. The substrate support (3) being connected to the base assembly through a bearing (11) that facilitates rotation of the substrate support. The substrate support assembly is provided with a temperature sensor (13) to measure the temperature of the bearing (11). |
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