Photosensitive resin composition, cured product, partition wall, organic electroluminescent element, color filter, image display apparatus, and cured product forming method

Provided is a photosensitive resin composition that has high liquid repellency even with a low curing temperature and that does not cause flaws such as infiltration of ink. A photosensitive resin composition according to the present invention contains a photopolymerizable compound (A), a photoinitia...

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Bibliographische Detailangaben
Hauptverfasser:	IMAI, NAOAKI, MISHIMA, KOUTARO, TOSHIMITSU, ERIKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided is a photosensitive resin composition that has high liquid repellency even with a low curing temperature and that does not cause flaws such as infiltration of ink. A photosensitive resin composition according to the present invention contains a photopolymerizable compound (A), a photoinitiator (B), an alkali-soluble resin (C), and a liquid repelling agent (D). The photosensitive resin composition is characterized in that: the alkali-soluble resin (C) contains a copolymer resin (C1) having, in the main chain, a repeating unit including an aliphatic multi-ring structure; and the liquid repelling agent (D) contains a compound (D1) having a crosslinking group and having a fluorine atom and/or a siloxane chain.