Semiconductor device

In some embodiments, the present disclosure relates to a device that includes an active layer, a gate electrode, a passivation structure, a source contact, and a drain contact arranged over a substrate. The gate electrode is arranged over the substrate and is spaced apart from the active layer by a...

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Hauptverfasser: TSAI, WU-WEI, CHEN, HAIING
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:In some embodiments, the present disclosure relates to a device that includes an active layer, a gate electrode, a passivation structure, a source contact, and a drain contact arranged over a substrate. The gate electrode is arranged over the substrate and is spaced apart from the active layer by a gate dielectric layer. The passivation structure is arranged over the active layer. The source contact extends through the passivation structure and contacts the active layer. The drain contact extends through the passivation structure and contacts the active layer. The passivation structure is hydrophobic.