Method for cleaning and drying wafer

A method for cleaning and drying wafer is provided to solve the problem that the conventional process of cleaning and drying wafer causes collapsing of the microstructure of transistor on the wafer. The method includes an obliquing step, a washing step and a drying step. The obliquing step is tiltin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANG, CHIHNG, LIN, CHUNU, WU, PEI-YU, CHEN, WENUNG, CHANG, TINGANG, KUO, CHUAN-WEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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