Vapor chamber and working fluid used therefor wherein the working fluid includes a mixture of acetone and hydrofluorocarbon

The present invention provides a vapor chamber and a working fluid used for the vapor chamber, comprising: an upper plate with a first structural surface; a lower plate with a second structural surface, wherein the second structural surface is mutually facing to the first structural surface; a gaseo...

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Bibliographische Detailangaben
Hauptverfasser: SUBEDI, BIMAL, KIM, YONG-DAE, KONG, YUAN, CHO, YOUNG-SOO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention provides a vapor chamber and a working fluid used for the vapor chamber, comprising: an upper plate with a first structural surface; a lower plate with a second structural surface, wherein the second structural surface is mutually facing to the first structural surface; a gaseous channel, formed on at least one of the first structural surface and the second structural surface, and forming a channel for the gaseous working fluid to flow from the evaporation part to the condensing part through heat energy; and a liquid channel, formed on at least one of the first structural surface and the second structural surface and forming a channel for allowing liquid working fluid to move from the condensing part to the evaporation part through capillary force; wherein the working fluid includes a mixture of acetone and hydrofluorocarbon.