Substrate processing apparatus
A substrate processing apparatus comprising: a stage 30 on which a substrate 2 with a plurality of elements 4a, 4b, 4c disposed thereon is installed; an upper member 21 covering the top of the stage 30 and forming a processing chamber 6 providing a pressurization space between the upper member 21 an...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A substrate processing apparatus comprising: a stage 30 on which a substrate 2 with a plurality of elements 4a, 4b, 4c disposed thereon is installed; an upper member 21 covering the top of the stage 30 and forming a processing chamber 6 providing a pressurization space between the upper member 21 and the stage 30; and a sheet holding unit 40 for holding an elastic sheet 80 between the stage 30 and the upper member 21. The stage 30 has a first suction hole 31 formed to span between the inside and outside of an outer edge portion 34a of a substrate installed region 34, and a second suction hole 32 formed on the inside of the substrate installed region 34. The sheet holding unit 40 places the elastic sheet 80 over the stage 30 so as to cover the substrate 2. |
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