Substrate support and substrate processing apparatus
There is provided a substrate support comprising: a base; a first flow path that opens on a bottom surface of the base at a central portion of the base; a second flow path that surrounds the first flow path and opens on the bottom surface of the base; one or more third flow paths communicating with...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | There is provided a substrate support comprising: a base; a first flow path that opens on a bottom surface of the base at a central portion of the base; a second flow path that surrounds the first flow path and opens on the bottom surface of the base; one or more third flow paths communicating with the first flow path and arranged from the central portion toward an outer peripheral portion of the base; and one or more fourth flow paths communicating with the second flow path, arranged from the central portion toward the outer peripheral portion of the base, and communicating with said one or more third flow paths at the outer peripheral portion of the base. |
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