Polybenzoxazole precursor and application thereof

The present invention provides a polybenzoxazole precursor comprising a structure of formula (I):, wherein the definitions of Y, Z, R1, I, j, and V are provided herein. By means of the polybenzoxazole precursor, the resin composition of the present invention is able to forming a film with low dissip...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HSU, STEVE LIENUNG, SHIH, YUIAO, LIN, YUING, CHENG, HOUIEH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention provides a polybenzoxazole precursor comprising a structure of formula (I):, wherein the definitions of Y, Z, R1, I, j, and V are provided herein. By means of the polybenzoxazole precursor, the resin composition of the present invention is able to forming a film with low dissipation factor and high contrast.