Tin compound, raw materials for forming thin film, thin film, method for manufacturing thin film, and halogen compound

The present invention provides a tin compound which is represented by general formula (1). (In formula (1), each of R1 and R2 independently represents an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms; each of R3 and R4 independently represents an alkyl gro...

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Bibliographische Detailangaben
Hauptverfasser:	OOE, YOSHIKI, YAMASHITA, ATSUSHI, YOSHINO, TOMOHARU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a tin compound which is represented by general formula (1). (In formula (1), each of R1 and R2 independently represents an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms; each of R3 and R4 independently represents an alkyl group having 1 to 5 carbon atoms; and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.).