Plasma treatment device

Provided is a plasma treatment device which is highly safe and with which running costs can be suppressed. A plasma treatment device comprises: a vacuum container; a treatment chamber that is disposed inside the vacuum container; and a gas supply unit provided with a treatment gas line that supplies...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SATO, KOHEI, ISOMURA, RYOICHI, TAKAO, YUSUKE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Provided is a plasma treatment device which is highly safe and with which running costs can be suppressed. A plasma treatment device comprises: a vacuum container; a treatment chamber that is disposed inside the vacuum container; and a gas supply unit provided with a treatment gas line that supplies a treatment gas into the treatment chamber so as to form plasma in the treatment chamber. The treatment unit includes: a plurality of pipes through which a plurality of types of gases are allowed to flow, respectively; and a box that encloses the pipes. Air that has been temperature-adjusted to a prescribed range is supplied to the box.