Polishing device
The present invention improves uniformity of a supply range of a polishing liquid when supplying the polishing liquid while moving, over a polishing pad, a polishing liquid supply head having a plurality of polishing liquid supply ports. A polishing device 1 includes: a polishing table for supportin...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention improves uniformity of a supply range of a polishing liquid when supplying the polishing liquid while moving, over a polishing pad, a polishing liquid supply head having a plurality of polishing liquid supply ports. A polishing device 1 includes: a polishing table for supporting a polishing pad 100; a polishing head 30 for holding an object; and a polishing liquid supply device 40 for supplying a polishing liquid between the polishing pad 100 and the object. The polishing liquid supply device 40 includes: a polishing liquid supply head 41 having a plurality of polishing liquid supply ports 414; a link mechanism 60 configured to move the polishing liquid supply head 41 along a polishing surface of the polishing pad 100; and a drive mechanism 90 configured to drive the link mechanism 60. The drive mechanism 90 is configured to drive the link mechanism 60 so that the plurality of polishing liquid supply ports 414 are aligned along the radial direction of the polishing pad 100 in a first sta |
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