Conditioning apparatus and method

There is provided an apparatus for conditioning a component of a lithography apparatus, the apparatus including: a housing configured to contain a hydrogen plasma; a hydrogen plasma generator configured to provide a hydrogen plasma to the component; wherein the apparatus is configured to control at...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	VAN DE KERKHOF, MARCUS ADRIANUS, VAN HAL, PAULUS ALBERTUS, SBRIZZAI, FABIO, KOEVOETS, ADRIANUS HENDRIK, VAN DER VOORT, DENNIS DOMINIC
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	There is provided an apparatus for conditioning a component of a lithography apparatus, the apparatus including: a housing configured to contain a hydrogen plasma; a hydrogen plasma generator configured to provide a hydrogen plasma to the component; wherein the apparatus is configured to control at least one of: the ratio of hydrogen ions to hydrogen radicals in the hydrogen plasma, the distance between the housing and the component being conditioned, and the energy of the plasma. Also described is a method of conditioning a surface of a component of a lithography apparatus, a lithography apparatus, and the use of such apparatuses or methods in a lithographic apparatus or process.