Multi-beam digital scan and image acquisition
A multi-beam charged particle microscope and a method of operating a multi-beam charged particle microscope for wafer inspection with high throughput and with high resolution and high reliability is provided. The method of operation and the multi-beam charged particle beam microscope comprises means...
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| Hauptverfasser: | , , , , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A multi-beam charged particle microscope and a method of operating a multi-beam charged particle microscope for wafer inspection with high throughput and with high resolution and high reliability is provided. The method of operation and the multi-beam charged particle beam microscope comprises means for a synchronized scanning operation and image acquisition by a plurality of charged particle beamlets according a selected scan program, wherein the selected scan program can be selected according an inspection task from different scan programs. |
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