Vibration damping apparatus, reaction force processing system, stage apparatus, exposure apparatus, substrate processing device, and method for manufacturing article

Vibration damping apparatus, reaction force processing system, stage apparatus, exposure apparatus, substrate processing device, and method for manufacturing article

A vibration damping apparatus configured to damp a vibration of a target member includes a mass body, a base disposed on the target member, a support member disposed on the base and configured to support the mass body, a housing disposed on the base so as to surround the support member, an elastic m...

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Bibliographische Detailangaben
1. Verfasser: UENO, MASAMICHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A vibration damping apparatus configured to damp a vibration of a target member includes a mass body, a base disposed on the target member, a support member disposed on the base and configured to support the mass body, a housing disposed on the base so as to surround the support member, an elastic member disposed so as to form a space in the housing and configured to apply a force to the support member, and a control unit configured to control a pressure of a fluid in the space by supplying the fluid to the space based on a vibration state of the target member.