Process cell for field guided post exposure bake process
Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module and includes an uppe...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | LUBOMIRSKY, DMITRY TSO, ALAN L HANSON, KYLE M SUN, JIA-YI KOZHIKKALKANDI, RAHUL BUCHBERGER JR., DOUGLAS A LIANG, QIWEI YIEH, ELLIE Y HUANG, LANCE LAN-SI MCHUGH, PAUL R ALEX, NITHIN THOMAS |
| description | Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module and includes an upper portion with an electrode and a base portion which is configured to support a substrate on a substrate support surface. The upper portion and the base portion are actuated toward and away from one another using one or more arms and form a process volume. The process volume is filled with a process fluid and the processing module is rotated about an axis. An electric field is applied to the substrate by the electrode before the process fluid is drained from the process volume. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202245562A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202245562A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202245562A3</originalsourceid><addsrcrecordid>eNrjZLAIKMpPTi0uVkhOzclRSMsvUkjLTM1JUUgvzUxJTVEoyC8uUUitAFKlRakKSYnZqQoFEA08DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSQ-JNzIwMjIxNTUzMjRmBg1APw0Llo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Process cell for field guided post exposure bake process</title><source>esp@cenet</source><creator>LUBOMIRSKY, DMITRY ; TSO, ALAN L ; HANSON, KYLE M ; SUN, JIA-YI ; KOZHIKKALKANDI, RAHUL ; BUCHBERGER JR., DOUGLAS A ; LIANG, QIWEI ; YIEH, ELLIE Y ; HUANG, LANCE LAN-SI ; MCHUGH, PAUL R ; ALEX, NITHIN THOMAS</creator><creatorcontrib>LUBOMIRSKY, DMITRY ; TSO, ALAN L ; HANSON, KYLE M ; SUN, JIA-YI ; KOZHIKKALKANDI, RAHUL ; BUCHBERGER JR., DOUGLAS A ; LIANG, QIWEI ; YIEH, ELLIE Y ; HUANG, LANCE LAN-SI ; MCHUGH, PAUL R ; ALEX, NITHIN THOMAS</creatorcontrib><description>Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module and includes an upper portion with an electrode and a base portion which is configured to support a substrate on a substrate support surface. The upper portion and the base portion are actuated toward and away from one another using one or more arms and form a process volume. The process volume is filled with a process fluid and the processing module is rotated about an axis. An electric field is applied to the substrate by the electrode before the process fluid is drained from the process volume.</description><language>chi ; eng</language><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; PRINTED CIRCUITS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221116&DB=EPODOC&CC=TW&NR=202245562A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221116&DB=EPODOC&CC=TW&NR=202245562A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LUBOMIRSKY, DMITRY</creatorcontrib><creatorcontrib>TSO, ALAN L</creatorcontrib><creatorcontrib>HANSON, KYLE M</creatorcontrib><creatorcontrib>SUN, JIA-YI</creatorcontrib><creatorcontrib>KOZHIKKALKANDI, RAHUL</creatorcontrib><creatorcontrib>BUCHBERGER JR., DOUGLAS A</creatorcontrib><creatorcontrib>LIANG, QIWEI</creatorcontrib><creatorcontrib>YIEH, ELLIE Y</creatorcontrib><creatorcontrib>HUANG, LANCE LAN-SI</creatorcontrib><creatorcontrib>MCHUGH, PAUL R</creatorcontrib><creatorcontrib>ALEX, NITHIN THOMAS</creatorcontrib><title>Process cell for field guided post exposure bake process</title><description>Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module and includes an upper portion with an electrode and a base portion which is configured to support a substrate on a substrate support surface. The upper portion and the base portion are actuated toward and away from one another using one or more arms and form a process volume. The process volume is filled with a process fluid and the processing module is rotated about an axis. An electric field is applied to the substrate by the electrode before the process fluid is drained from the process volume.</description><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>PRINTED CIRCUITS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAIKMpPTi0uVkhOzclRSMsvUkjLTM1JUUgvzUxJTVEoyC8uUUitAFKlRakKSYnZqQoFEA08DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSQ-JNzIwMjIxNTUzMjRmBg1APw0Llo</recordid><startdate>20221116</startdate><enddate>20221116</enddate><creator>LUBOMIRSKY, DMITRY</creator><creator>TSO, ALAN L</creator><creator>HANSON, KYLE M</creator><creator>SUN, JIA-YI</creator><creator>KOZHIKKALKANDI, RAHUL</creator><creator>BUCHBERGER JR., DOUGLAS A</creator><creator>LIANG, QIWEI</creator><creator>YIEH, ELLIE Y</creator><creator>HUANG, LANCE LAN-SI</creator><creator>MCHUGH, PAUL R</creator><creator>ALEX, NITHIN THOMAS</creator><scope>EVB</scope></search><sort><creationdate>20221116</creationdate><title>Process cell for field guided post exposure bake process</title><author>LUBOMIRSKY, DMITRY ; TSO, ALAN L ; HANSON, KYLE M ; SUN, JIA-YI ; KOZHIKKALKANDI, RAHUL ; BUCHBERGER JR., DOUGLAS A ; LIANG, QIWEI ; YIEH, ELLIE Y ; HUANG, LANCE LAN-SI ; MCHUGH, PAUL R ; ALEX, NITHIN THOMAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202245562A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>PRINTED CIRCUITS</topic><toplevel>online_resources</toplevel><creatorcontrib>LUBOMIRSKY, DMITRY</creatorcontrib><creatorcontrib>TSO, ALAN L</creatorcontrib><creatorcontrib>HANSON, KYLE M</creatorcontrib><creatorcontrib>SUN, JIA-YI</creatorcontrib><creatorcontrib>KOZHIKKALKANDI, RAHUL</creatorcontrib><creatorcontrib>BUCHBERGER JR., DOUGLAS A</creatorcontrib><creatorcontrib>LIANG, QIWEI</creatorcontrib><creatorcontrib>YIEH, ELLIE Y</creatorcontrib><creatorcontrib>HUANG, LANCE LAN-SI</creatorcontrib><creatorcontrib>MCHUGH, PAUL R</creatorcontrib><creatorcontrib>ALEX, NITHIN THOMAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LUBOMIRSKY, DMITRY</au><au>TSO, ALAN L</au><au>HANSON, KYLE M</au><au>SUN, JIA-YI</au><au>KOZHIKKALKANDI, RAHUL</au><au>BUCHBERGER JR., DOUGLAS A</au><au>LIANG, QIWEI</au><au>YIEH, ELLIE Y</au><au>HUANG, LANCE LAN-SI</au><au>MCHUGH, PAUL R</au><au>ALEX, NITHIN THOMAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Process cell for field guided post exposure bake process</title><date>2022-11-16</date><risdate>2022</risdate><abstract>Apparatus and method for substrate processing are described herein. More specifically, the apparatus and method are directed towards apparatus and method for performing a field guided post exposure bake operation on a semiconductor substrate. The apparatus is a processing module and includes an upper portion with an electrode and a base portion which is configured to support a substrate on a substrate support surface. The upper portion and the base portion are actuated toward and away from one another using one or more arms and form a process volume. The process volume is filled with a process fluid and the processing module is rotated about an axis. An electric field is applied to the substrate by the electrode before the process fluid is drained from the process volume.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_TW202245562A |
| source | esp@cenet |
| subjects | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS PRINTED CIRCUITS |
| title | Process cell for field guided post exposure bake process |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T12%3A33%3A06IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LUBOMIRSKY,%20DMITRY&rft.date=2022-11-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW202245562A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |