Apparatus and method for analysing an element of a photolithography process with the aid of a transformation model

The present invention relates to an apparatus (500) for analysing an element (470) of a photolithography process, said apparatus comprising: (a) a first measuring apparatus (500, 510, 560) for recording first data (230) of the element (470); and (b) means for transforming the first data (230) into s...

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Bibliographische Detailangaben
Hauptverfasser:	SCHMIDT, CARSTEN, HUSEMANN, CHRISTOPH, SEIDEL, DIRK, SCHERUEBL, THOMAS, FREYTAG, ALEXANDER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTEDFOR SPECIFIC APPLICATION FIELDS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to an apparatus (500) for analysing an element (470) of a photolithography process, said apparatus comprising: (a) a first measuring apparatus (500, 510, 560) for recording first data (230) of the element (470); and (b) means for transforming the first data (230) into second, non-measured data (250), which correspond to measurement data (420) of a measurement of the element (470) with a second measuring apparatus (400); (c) wherein the means comprise a transformation model (200), which has been trained using a multiplicity of first data (235) used for training purposes and second data (265) corresponding therewith, which are linked to the second measuring apparatus (400).