Heat source device, substrate support device and substrate processing facility
The present invention relates to a heat source device, a substrate support device, and a substrate processing facility comprising the same. According to the present invention, a substrate can be uniformly heated and stably supported by a chamber having an inner space where the substrate is treated,...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | The present invention relates to a heat source device, a substrate support device, and a substrate processing facility comprising the same. According to the present invention, a substrate can be uniformly heated and stably supported by a chamber having an inner space where the substrate is treated, and a substrate support device installed in the chamber to stably support the substrate and a heat source device installed in the chamber to uniformly heat the substrate. |
|---|