Apparatus and methods for gas phase particle reduction

Embodiments of the present disclosure generally relate chamber lids and methods of using such for gas-phase particle reduction. In an embodiment is provided a chamber lid that includes a top wall, a bottom wall, a plurality of vertical sidewalls, and an interior volume within the chamber lid defined...

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Bibliographische Detailangaben
Hauptverfasser: CAO, BIN, CHEN, SHIHUNG, RASHEED, MUHAMMAD M, MUSTAFA, MUHANNAD, SHA, HAO-YAN, SILVETTI, MARIO D, LIN, CHIOU, LIN, YONG-JING
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Embodiments of the present disclosure generally relate chamber lids and methods of using such for gas-phase particle reduction. In an embodiment is provided a chamber lid that includes a top wall, a bottom wall, a plurality of vertical sidewalls, and an interior volume within the chamber lid defined by the top wall, the bottom wall, and the plurality of vertical sidewalls. The chamber lid further includes a plurality of air flow apertures, wherein the plurality of air flow apertures is configured to fluidly communicate air into the interior volume and out of the interior volume, and a mesh disposed on a face of at least one of the air flow apertures of the plurality of air flow apertures. In another embodiment is provided a method of processing a substrate in a substrate processing chamber, the substrate processing chamber comprising a chamber lid as described herein.