Light source intensity control systems and methods for improved light scattering polarimetry measurements

Systems and methods of performing a stress measurement of a chemically strengthened glass [10] using a light-scattering polarimetry system [200] include adjusting the intensity of a light beam [216] from a light source [212] in an illumination system [210] using a rotatable half-wave plate [500] and...

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Bibliographische Detailangaben
Hauptverfasser:	OLSON, EVAN LEWIS, IMMERMAN, JACOB, FURNAS, WILLIAM JOHN, JACOBSON, JEREMIAH ROBERT, BOUZI, PIERRE MICHEL, LINDBERG, KATHERINE ANNE, WETMORE, NATHANIEL DAVID, ANDREWS, RYAN CLAUDE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TESTING
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Beschreibung
Zusammenfassung:	Systems and methods of performing a stress measurement of a chemically strengthened glass [10] using a light-scattering polarimetry system [200] include adjusting the intensity of a light beam [216] from a light source [212] in an illumination system [210] using a rotatable half-wave plate [500] and a first polarizer [600] operably disposed between the light source and a rotating light diffuser [222] that has a rotation time tR. The first polarizer is aligned with a second polarizer [232] in a downstream optical compensator [230] to have matching polarization directions by rotating the rotatable half-wave plate to a position [P] where the exposure time tE falls within an exposure range tR ≤ tE. The method also includes performing an exposure using the exposure time tE to obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light [R1, R2, R3, R4] from entering the light source.