Semiconductor device

A semiconductor device includes an insulating layer, wherein the insulating layer has a via opening and a conductive line opening. The semiconductor device further includes a via in the via opening, wherein the via includes a first conductive material. The semiconductor device further includes a con...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIN, CHI-FENG, LIU, YAO-MIN, CHIN, SHUNG, CHI, CHIHIEN, SU, HUNG-WEN
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:A semiconductor device includes an insulating layer, wherein the insulating layer has a via opening and a conductive line opening. The semiconductor device further includes a via in the via opening, wherein the via includes a first conductive material. The semiconductor device further includes a conductive line in the conductive line opening. The conductive line includes a first liner layer, wherein a first thickness of the first liner layer over the via is less than a second thickness of the first liner layer over the insulating layer, and a conductive fill comprising a second conductive material different from the first conductive material.