Measurement system and method of use

A measurement system, the measurement system comprising: a sensor apparatus; an illumination system arranged to illuminate the sensor apparatus with radiation, the sensor apparatus comprising a patterned region arranged to receive a radiation beam and to form a plurality of diffraction beams, the di...

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Bibliographische Detailangaben
Hauptverfasser:	PAGANO, ROBERTO, SPIJKMAN, MARK-JAN, WOESSNER, ACHIM
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLORIMETRY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION PYROMETRY TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A measurement system, the measurement system comprising: a sensor apparatus; an illumination system arranged to illuminate the sensor apparatus with radiation, the sensor apparatus comprising a patterned region arranged to receive a radiation beam and to form a plurality of diffraction beams, the diffraction beams being separated in a shearing direction; the sensor apparatus comprising a radiation detector; wherein the patterned region is arranged such that at least some of the diffraction beams form interference patterns on the radiation detector; wherein the sensor apparatus comprises a plurality of patterned regions, and wherein pitches of the patterned regions are different in adjacent patterned regions.