Wafer processing apparatus with a rotatable table

The disclosure relates to a wafer processing apparatus for processing wafers with a rotatable table provided with a support constructed and arranged to support a removable holder for storing a plurality of wafers. A drive assembly may be provided to provide a rotary movement to the rotatable table a...

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Bibliographische Detailangaben
Hauptverfasser: PATIL, ANIKET NITIN, OOSTERLAKEN, THEODORUS G.M, KOTHARI, NIMIT
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The disclosure relates to a wafer processing apparatus for processing wafers with a rotatable table provided with a support constructed and arranged to support a removable holder for storing a plurality of wafers. A drive assembly may be provided to provide a rotary movement to the rotatable table around a vertical axis perpendicular to the table; and, a supply line may be constructed and arranged to supply utilities to the rotatable table. The drive assembly may be controlled and configured to create the rotary movement of the table in a clockwise and/or an anticlockwise direction to avoid breakage of the supply line.