System for a surface treatment of a substrate with a fluid

System for a surface treatment of a substrate with a fluid

The present application relates to a system for a surface treatment of a substrate with a fluid and a method for a surface treatment of a substrate with a fluid. The system for a surface treatment of a substrate with a fluid comprises a substrate holder, a cover, and a treatment chamber. The substra...

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Bibliographische Detailangaben
Hauptverfasser: OTZLINGER, HERBERT, GLEISSNER, ANDREAS, TSCHINDERLE, ULRICH
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Beschreibung
Zusammenfassung:The present application relates to a system for a surface treatment of a substrate with a fluid and a method for a surface treatment of a substrate with a fluid. The system for a surface treatment of a substrate with a fluid comprises a substrate holder, a cover, and a treatment chamber. The substrate holder is configured to hold the substrate to be treated. The cover is attachable to the substrate holder and configured to cover the substrate at least partially. The treatment chamber comprises a rinsing unit to rinse the cover. The rinsing unit is configured to handle the cover relative to the substrate holder. The treatment chamber further comprises a drying unit to dry the cover.