Apparatus for analysing and/or processing a sample with a particle beam and method
What is proposed is an apparatus (100) for analysing and/or processing a sample (10) with a particle beam (110), comprising: a providing unit (106) for providing the particle beam (110); a shielding element (202) for shielding an electric field (E) generated by charges (Q) accumulated on the sample...
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| Hauptverfasser: | , , , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | What is proposed is an apparatus (100) for analysing and/or processing a sample (10) with a particle beam (110), comprising: a providing unit (106) for providing the particle beam (110); a shielding element (202) for shielding an electric field (E) generated by charges (Q) accumulated on the sample (10), wherein the shielding element (202) has a through opening (206) for the particle beam (110) to pass through towards the sample (10); a detecting unit (112) configured to detect an actual position of the shielding element (202); and an adjusting unit (600) for adjusting the shielding element (202) from the actual position into a target position. |
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