Chemical mechanical polishing slurry and method of using the same

The invention provides a chemical mechanical polishing slurry for Copper CMP and a method of use thereof. Specifically, the chemical mechanical polishing slurry includes abrasive particle, complexing agent, azole corrosion inhibitor, carboxylic acid ester compound, and oxidizer. The chemical mechani...

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Bibliographische Detailangaben
Hauptverfasser:	CAI, XIN-YUAN, LIU, TIAN-QI, ZHENG, RHEA SHAN-SHAN, ZHOU, WEN-TING, MA, JEREMY JIAN, NI, MASON YU-FEI, YANG, VIOLA JUN-YA, JING, JIAN-FEN, XU, PENG-LIANG, LI, RYAN YUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SEMICONDUCTOR DEVICES SKI WAXES
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Beschreibung
Zusammenfassung:	The invention provides a chemical mechanical polishing slurry for Copper CMP and a method of use thereof. Specifically, the chemical mechanical polishing slurry includes abrasive particle, complexing agent, azole corrosion inhibitor, carboxylic acid ester compound, and oxidizer. The chemical mechanical polishing slurry of the present invention can be used in Copper CMP with high Copper removal rate, high Copper to Tantalum removal rate selectivity. It also has good dishing and erosion control capability.