Alkali-soluble copolymer comprising maleimide derivative as polymerized unit and photoresist composition comprising the same

The present invention relates to an alkali-soluble copolymer and a photoresist composition comprising the same, and more specifically, a copolymer that comprises (meth)acrylic monomer and maleimide monomer having functional aryl substituent as polymerized units and thus shows remarkably improved alk...

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Bibliographische Detailangaben
Hauptverfasser:	KWON, GUOL, KIM, TAE-OON, LEE, DUCK-HEE, HAN, MI-JUNG, KIM, SUN-HYUNG, BYUN, WON-SOO, LEE, WON-JUNG, JANG, SEUNG-HYUN, OH, CHUN-RIM, JEONG, EUN-MI, SEE, YOON-KI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to an alkali-soluble copolymer and a photoresist composition comprising the same, and more specifically, a copolymer that comprises (meth)acrylic monomer and maleimide monomer having functional aryl substituent as polymerized units and thus shows remarkably improved alkali solubility, and a photoresist composition that comprises the same and can be removed by a water-soluble solution, and thus can be used in LED, TFT-LCD, MEMS, and semiconductor field.