Computer System of Observation Device and Processing Method

As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation device 1 includes an observation unit 103 that obtains an image for observing a sample 101...

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Bibliographische Detailangaben
Hauptverfasser:	TAKADA, SATOSHI, FUKUDA, MIYUKI, MIYAKE, KOZO, MATSUMOTO, KOSUKE, NAKAYAMA, HIDEKI, ISOMAE, YUYA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation device 1 includes an observation unit 103 that obtains an image for observing a sample 101 on a stage 102. A computer system 2 of the observation device 1 acquires the image from the observation unit 103, specifies a period of a pattern-formed unit region repeatedly formed on a surface of the sample 101 from the image, and generates a recipe including observation or inspection alignment positions of the sample 101 using the specified period.