Method for supplying chemical solution and pattern forming method

The present invention addresses the problem of providing a method for supplying chemical solution, the method configured to further reduce the content of impurities in the chemical solution. The present invention also addresses the problem of providing a pattern formation method. This method for sup...

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Bibliographische Detailangaben
1. Verfasser:	YOSHIDOME, MASAHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	The present invention addresses the problem of providing a method for supplying chemical solution, the method configured to further reduce the content of impurities in the chemical solution. The present invention also addresses the problem of providing a pattern formation method. This method for supplying chemical solution supplies a chemical solution containing an organic solvent through a conduit provided in an apparatus for a semiconductor device, the method comprising a gas pressurizing/delivery step for pressurizing the chemical solution with a gas in order to deliver the chemical solution. The moisture content of the gas is 0.00001 to 1 mass ppm with respect to the total mass of the gas.