Workpiece holder, system and operating method for pecvd

The present invention relates to a workpiece holder (1) for a plasma-enhanced chemical vapour deposition system (50), to a system (50) of this kind, and to an operating method (100) for a system (50) of this kind. The workpiece holder (1) is designed to produce a plasma from a process gas surroundin...

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Bibliographische Detailangaben
Hauptverfasser:	REIZE, RALF, LEICHTLE, ROLAND, TROELLER, MIRKO, FUCHS, JENS-UWE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a workpiece holder (1) for a plasma-enhanced chemical vapour deposition system (50), to a system (50) of this kind, and to an operating method (100) for a system (50) of this kind. The workpiece holder (1) is designed to produce a plasma from a process gas surrounding the workpiece holder (1). According to the invention, the workpiece holder (1) is also designed to heat the surroundings of the workpiece holder (1) to a process temperature envisaged for the vapour deposition.