Method for manufacturing cylindrical sputtering target, and cylindrical sputtering target

This method for manufacturing a cylindrical sputtering target has: a primary coating step for forming a primary coat layer, by using a primary coat solder made of In, Sn, or an Sn-In alloy, on a joint surface of each of a cylindrical sputtering target material and a backing tube; an assembling step...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OKANO, SHIN, OHTOMO, TAKESHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This method for manufacturing a cylindrical sputtering target has: a primary coating step for forming a primary coat layer, by using a primary coat solder made of In, Sn, or an Sn-In alloy, on a joint surface of each of a cylindrical sputtering target material and a backing tube; an assembling step for assembling the sputtering target material and the backing tube after the primary coating step; and a solder joining step for joining the assembled sputtering target material and the backing tube by using joining solder made of an Sn-In-Zn-based alloy containing Sn, In, and Zn.