Method for manufacturing cylindrical sputtering target, and cylindrical sputtering target
This method for manufacturing a cylindrical sputtering target has: a primary coating step for forming a primary coat layer, by using a primary coat solder made of In, Sn, or an Sn-In alloy, on a joint surface of each of a cylindrical sputtering target material and a backing tube; an assembling step...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | This method for manufacturing a cylindrical sputtering target has: a primary coating step for forming a primary coat layer, by using a primary coat solder made of In, Sn, or an Sn-In alloy, on a joint surface of each of a cylindrical sputtering target material and a backing tube; an assembling step for assembling the sputtering target material and the backing tube after the primary coating step; and a solder joining step for joining the assembled sputtering target material and the backing tube by using joining solder made of an Sn-In-Zn-based alloy containing Sn, In, and Zn. |
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