Device and method for evaporating an organic powder

The invention relates to a device and a method for evaporating a non-gaseous starting material, in which method the starting material is introduced into an evaporation chamber (3) of an evaporator (1); an evaporation element (4) of the evaporator (1) supplies heat to the starting material such that...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	JAKOB, MARKUS, EICHLER, ANDY
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BOILING BOILING APPARATUS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention relates to a device and a method for evaporating a non-gaseous starting material, in which method the starting material is introduced into an evaporation chamber (3) of an evaporator (1); an evaporation element (4) of the evaporator (1) supplies heat to the starting material such that it is evaporated to create a vapour; the vapour is transported by means of a conveying gas flow, which is fed through a gas supply line (9) into the evaporation chamber (3) and the mass flow of which is controlled by a first mass flow controller (10), through a conveying channel (7) and past a sensor (8), which measures the concentration or the partial pressure of the vapour in the gas flow flowing through the conveying channel (7); and the mass flow of the vapour through the conveying channel (7) is controlled by varying the conveying gas flow with respect to a setpoint value. In order to keep the vapour flow delivered by the device largely constant over time, a compensating gas flow is fed into the conveying chan