Systems and methods for an improved magnetron electromagnetic assembly

The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the hous...

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Bibliographische Detailangaben
Hauptverfasser: RIOS REYES, JUAN, FORGEY, CHRISTIAN K, LARIVIERE, MARC-ANDRE, TRANG, BRENDAN V, CORRERA, MICHAEL S, SENSEMAN, WILLIAM, CHOUDHARY, NITIN, LI, CHSO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention provides a magnetron system, comprising a baseplate assembly. The baseplate assembly defining a housing portion and a power feedthrough. A sputtering target is disposed within the housing portion of the baseplate assembly. An electromagnetic assembly is disposed within the housing portion of the baseplate assembly. The electromagnetic assembly comprising a plurality of electromagnet pairs and a plurality of magnet pairs, wherein the plurality of electromagnet pairs and the plurality of magnet pairs are arranged in an alternating order such that at least one electromagnet pair of the plurality of electromagnet pairs is juxtapositioned between two magnet pairs of the plurality of magnet pairs, and at least one magnet pair of the plurality of magnet pairs is juxtapositioned between two electromagnet pairs of the plurality of electromagnet pairs.