Substrate processing apparatus and substrate processing method

A placement unit 40 of a substrate processing apparatus includes a substrate support part 411 and a measuring part 413. The substrate support part 411 supports a substrate 9 in a horizontal state. The measuring part 413 measures the edge position which is a position in the horizontal direction of the periphery of the substrate 9 supported by the substrate support part 411. A center robot receives the substrate 9 supported by the substrate support part 411 of the placement unit 40 and carries it into a processing unit. A calculation unit of a control unit obtains the center position of the substrate 9 based on the edge position measured by the measuring part 413. A transfer robot control unit adjusts the position of a hand of the center robot in the placement unit 40 based on the center position of the substrate 9 before the hand receives the substrate 9 from the substrate support part 411. Thereby, the positional accuracy of the substrate 9 carried into the processing unit can be improved.