Sputtering target, method for producing sputtering target and optical functional film

This sputtering target comprises a zinc oxide phase and one or more metal phases that are selected from among Nb, W and Ti, while having a density ratio of 80% or more; and the standard deviation of the respective contents of the one or more metal elements selected from among Nb, W and Ti, said cont...

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Bibliographische Detailangaben
Hauptverfasser:	KANEKO, DAISUKE, SUGIUCHI, YUKIYA, OKANO, SHIN, OHTOMO, TAKESHI, UMEMOTO, KEITA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	This sputtering target comprises a zinc oxide phase and one or more metal phases that are selected from among Nb, W and Ti, while having a density ratio of 80% or more; and the standard deviation of the respective contents of the one or more metal elements selected from among Nb, W and Ti, said contents being measured at a plurality of sites in the sputtering surface, is 5 mass% or less.