Mirror for a lithography system

The invention relates to a mirror for a lithography system. The mirror has a mirror body (12), which comprises a first mirror part (14), a second mirror part (15), an optical surface (13) for the reflection of light and a plurality of cooling channels (18). The first mirror part (14) and/or the seco...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	XALTER, STEFAN, POSTULKA, SOEREN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention relates to a mirror for a lithography system. The mirror has a mirror body (12), which comprises a first mirror part (14), a second mirror part (15), an optical surface (13) for the reflection of light and a plurality of cooling channels (18). The first mirror part (14) and/or the second mirror part (15) are made from a glass material, a glass ceramic material or a ceramic material. The first mirror part (14) and the second mirror part (15) are rigidly connected to one another. The cooling channels (18) are arranged in the first mirror part (14), are formed to be open towards a first outer surface (16) of the first mirror part (14) that adjoins the second mirror part (15), are fluidically connected to one another and are formed separately from one another in the region of the first outer surface (16) of the first mirror part (14) and surrounded in each case entirely by the material of the first mirror part (14).