Molybdenum oxide sputtering target and molybdenum oxide sputtering target production method

This molybdenum oxide sputtering target comprises a MoOX phase. In the MoOX phase: a MoO2 phase and a MoO3 phase are included; the remaining portion is unavoidable impurities; the area ratio of pores is 5% or less; the average area of pores is 0.5 [mu]m2 or less; and the average particle area of a c...

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Bibliographische Detailangaben
Hauptverfasser:	SUGIUCHI, YUKIYA, OKANO, SHIN, OHTOMO, TAKESHI, UMEMOTO, KEITA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	This molybdenum oxide sputtering target comprises a MoOX phase. In the MoOX phase: a MoO2 phase and a MoO3 phase are included; the remaining portion is unavoidable impurities; the area ratio of pores is 5% or less; the average area of pores is 0.5 [mu]m2 or less; and the average particle area of a crystalline structure is 5 [mu]m2 or less.